Effect of plasma properties on characteristics of silicon nitride film deposited by PECVD process at low temperature

Jeon G. HAN ,  Jun S. LEE ,  Bibhuti B. SAHU 외 3명

한국진공학회 학술발표회초록집

2016 .08

Passivation Properties of Hydrogenated Silicon Nitrides deposited by PECVD

Jae Eun Kim ,  Kyung Dong Lee ,  Yoonmook Kang 외 2명

한국진공학회 학술발표회초록집

2016 .02

Synthesis of SiNx:H films in PECVD using RF/UHF hybrid sources

K. S. Shin ,  B. B. Sahu ,  J. S. Lee 외 3명

한국진공학회 학술발표회초록집

2015 .08

Low-temperature PECVD silicon nitride film for the fabrication of capacitance type pressure sensor

Kyeong-Keun CHOI ,  Kee JONG ,  Jeong-Yoon LEE 외 1명

한국진공학회 학술발표회초록집

2016 .08

Realization of efficient barrier performance of a silicon nitride film simply via plasma chemistry

이준석 ,  Yong Yi Yin ,  B. B. Sahu 외 1명

한국진공학회 학술발표회초록집

2017 .02

Solving the RF coupling issue between chambers that share the ground in one PECVD system

Chul Lee ,  Yeajin Shin ,  Hojun Lee 외 1명

한국진공학회 학술발표회초록집

2020 .08

PECVD Synthesis of WS₂ for Hydrogen Evolution Catalysis

Kanade Vinit ,  Hyeong-U Kim ,  Seokjun Hong 외 1명

한국진공학회 학술발표회초록집

2020 .02

Silicon nitride deposition by VHF (162 MHz)-PECVD using a multi-tile push-pull plasma source

Ki Seok KIM ,  Albe ,  t Roge 외 2명

한국진공학회 학술발표회초록집

2016 .08

Low-Temperature Synthesis of Wafer Scale WS₂ by PECVD

Kanade Vinit ,  김형우 ,  박근상 외 1명

한국진공학회 학술발표회초록집

2019 .02

Low Temperature PECVD process for SiNx/Organic Multilayer Thin Film Encapsulation

Hyung June Ahn ,  Sang Heon Yong ,  Sun Jung Kim 외 3명

한국진공학회 학술발표회초록집

2017 .02

Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes

Seunghun Han ,  Sun Jung Kim ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes

Sun Jung Kim ,  Seunghun Han ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride

Seunghun Han ,  Byung hyun Oh ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .08

Stabilization of Real-time Thickness monitoring system in PECVD chamber

이철 ,  황혜주 ,  박상호 외 6명

한국진공학회 학술발표회초록집

2017 .08

Environmental reliability and barrier properties of SiOx, SiNx thin film by roll-to-roll PECVD system

Won Jae Lee ,  Tae-Yeon Cho ,  Sung-Hoon Choa 외 1명

한국진공학회 학술발표회초록집

2019 .08

Low-temperature synthesis of nc-Si/a-SiNx: H quantum dot thin films using RF/UHF high density PECVD plasmas

Yongyi Yin ,  B. B. Sahu ,  J. S. Lee 외 2명

한국진공학회 학술발표회초록집

2016 .02

RF analysis in tantalum nitride thin film resistor

Soon Hyeong KWON ,  Eunmi CHOI ,  A 외 8명

한국진공학회 학술발표회초록집

2016 .08

VHF-PECVD for a-Si:H and a-SiN:H Film Deposition

Jin Seok Kim

Applied Science and Convergence Technology

2019 .09

Optimized ultra-thin tunnel oxide layer characteristics by PECVD using N₂O plasma growth for high efficiency n-type Si solar cell

Minhan Jeon ,  Jiyoon Kang ,  Donghyun Oh 외 8명

한국진공학회 학술발표회초록집

2016 .02

Silicon Thin-film Solar Cell Deposited by Using High Working Pressure Plasma-enhanced Chemical Vapor Deposition System

권정대 ,  남기석 ,  김동호

한국진공학회 학술발표회초록집

2015 .02